Chloropolymer Precursor Utilization for the Nanostructured Co-Containing Carbon Layers Formation on Silicon Substrate

摘要

The possibility of nanostructured Co-containing carbon layers formation by means of the approach based on polyvinyl chloride alkaline dehydrochlorination in dimethyl sulfoxide in the presence of Co-nitrate is shown. From the mentioned reaction mixture, the layers of the carbon polymer precursor - polyvinylene formed during dehydrochlorination were deposited on the silicon wafer by spin coating. The obtained layers heat treatment up to 400 °Cresults in the formation of Co-carbon nanostructured continuous layers which structure is studied by the atomic force microscopy.