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Shear Stress Analysis of Synthesis and Nitric Oxide Release from Huvecs Exposed to Supraphysiologic Glucose

机译:从外部血糖暴露于Huvecs的合成和一氧化氮释放的剪切应力分析

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The purpose of this study is to analyze the magnitude and duration of shear stress in normal endothelial cell (HUVECs) cultures and those exposed to supraphicological glucose which affected synthesis and release of NO detected by bioassay techniques.The results of this study concluded that large shear stress applied to endothelial cell culture for a long time (±15 minutes) will increase the synthesis and release of NO. In normal endothelial cell culture a large shear stress exposure in a long time can increase NO synthesis and release very significantly compared to low shear stress (6 dyne/cm~2 for 5 minutes). Likewise, endothelial cell culture which was exposed to 22 mM glucose for 7 days, giving a large amount of shear stress for a long time (15 minutes) could increase NO synthesis and release, although it was far compared to normal endothelial cell culture. It can be said that the synthesis and release of NO in endothelial dysfunction can be improved through exposure to large and long-standing shear stress.
机译:本研究的目的是分析正常内皮细胞(HUVECS)培养物中的剪切应力的幅度和持续时间,以及暴露于寄生学葡萄糖的那些,这些葡萄糖受影响的合成和释放的生物测定技术未检测到。该研究的结果得出结论,大剪切施加到内皮细胞培养的压力长时间(±15分钟)将增加合成和释放NO。在正常内皮细胞培养中,与低剪切应力(6达因/ cm〜2 5分钟5分钟,长时间内,长时间的剪切应力暴露在长时间长时间不会显着显着增加合成和释放。同样地,暴露于22mm葡萄糖的内皮细胞培养物7天,长时间(15分钟)施用大量剪切应力(15分钟)可以不增加合成和释放,尽管与正常内皮细胞培养相比,但它远远不增加。可以说,通过暴露于大而长的剪切应力,可以改善内皮功能障碍中NO的合成和释放。

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