Advanced Micromorphology Analysis of Cu/Fe NPs Thin Films

摘要

In this work,an advanced analysis of Cu/Fe NPs thin films using atomic force microscopy(AFM)has been discussed to characterize at nanoscale 3-D surface microtexture.Samples of Cu/Fe thin films were fabricated by Direct Current-Magnetron Sputtering technique with two controlled thicknesses(group I:Cu 55 nm/Fe 55 nm and group II:Cu 55 nm/Fe 70 nm)in specific conditions of pressure and power.The results obtained from experimental measurements suggested that the surface of group I has the lowest values for fractal dimension(D = 2.28 ± 0.01)and root mean square height(Sq = 4.40 ± 0.1 nm);while the highest values for fractal dimension(D = 2.31 ± 0.01)and root mean square height(Sq = 4.67 ±0.1 nm)were found in group II.Stereometric and fractal analyses applied for thin films are modern tools for accurate quantitative morphometric characterisation.