首页> 外文期刊>Journal of Applied Polymer Science >Low-frequency ferroelectric switching studies inPVDFthin films across Cu or (Ag/Cu)/PVDF/Cu capacitor structures
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Low-frequency ferroelectric switching studies inPVDFthin films across Cu or (Ag/Cu)/PVDF/Cu capacitor structures

机译:低频铁电切换研究INPVDFTHIN薄膜跨CU或(AG / CU)/ PVDF / Cu电容器结构

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摘要

Ferroelectric switching dynamics of polyvinylidene fluoride (PVDF) thin films in Cu or (Ag/Cu)/PVDF/Cu capacitors are explored by varying PVDF film thickness, applied electric field amplitude (4.35-87.5 MV/m) and frequency (100 mHz-200 Hz). Comprehending spontaneous polarization and its dependence upon interfaces, an electric field is critical for organic ferroelectric memory devices. In this article, quasi-static current-voltage, and polarization-electric field measurements are used to explain the relationship between the coercive field, signal amplitude, and frequency. The observed coercivity enhancement at lower PVDF film thicknesses and with rising frequencies of the applied signal is discussed with Kolmogorov-Avrami-Ishibashi domain nucleation and growth model. The relation between domain growth and the top electrode layer is further discussed from the exponent parameters.
机译:通过改变聚偏氟乙烯(PVDF)薄膜厚度、外加电场幅值(4.35-87.5mV/m)和频率(100MHz-200Hz),研究了聚偏氟乙烯(PVDF)薄膜在铜或(Ag/Cu)/PVDF/Cu电容器中的铁电开关动力学。理解自发极化及其对界面的依赖性,电场对于有机铁电存储器件至关重要。在本文中,准静态电流电压和极化电场测量被用来解释矫顽场、信号振幅和频率之间的关系。用Kolmogorov-Avrami-Ishibashi磁畴成核和生长模型讨论了在较低PVDF薄膜厚度和外加信号频率升高时观察到的矫顽力增强。从指数参数进一步讨论了磁畴生长与顶部电极层的关系。

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