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Effects of Oxygen Gas on the Physical Properties of Tin Oxide Nano Films Using Laser Light as Ablation Source

机译:氧气对氧化锡纳米膜物理性质的影响使用激光作为烧蚀源

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摘要

The high quality, high transparent conductive nano and micro tin oxide) films were deposited successfully using reactive pulsed laser deposition (RPLD) method. The optical results shows a high transparency reached to (87) % and it found to reduction sharply with the low laser fluency. The value of the optical band gab of the deposited films at the optimum preparation condition is about 3.35eV.
机译:使用反应性脉冲激光沉积(RPLD)方法成功地沉积了高质量,高透明的导电纳米和微锡膜)膜。 光学结果显示出达到(87)%的高透明度,并且发现与低激光流畅性急剧下降。 在最佳制剂条件下沉积膜的光带GAB的值约为3.35EV。

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