NANOMECHANICAL TESTING OF Ti/Ni MULTILAYER THIN FILMS

摘要

The main aim of the present work was to study the dependence of mechanical properties of Ti/Ni multilayer thin films on the thicknesses of constituent Ti and Ni layers. The multilayer thin films were made by depositing Ti and Ni layers alternately on single crystalline silicon substrates using magnetron sputtering method. Thickness of individual Ti and Ni layers varied from 1.7 nm to 100 nm, the total multilayer thickness was around 1 μm.