LIMITATION OF HALL-PETCH RELATIONSHIP FOR INTERPRETING SCRATCH ON POLYCRYSTALLINE COPPER USING SPHERICAL INDENTER

机译：用球形压模解释多晶铜划痕的霍尔 - 腐败关系的限制

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摘要

It is widely known that grain boundary can play a big role in influencing crystal deformation (Hall-Petch effect). This has been intensively studied and widely used as a strengthening mechanism for material component design and manufacture.

机译：众所周知，晶界可以在影响晶体变形（霍尔竖起效应）方面发挥重要作用。这一点集中研究，广泛用作材料部件设计和制造的强化机制。

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《Nanomechanical Testing in Materials Research and Development Conference》|2018年|124p|共1页
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作者
Xiaodong Hou; Hannah Zhang;
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原文格式 PDF
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中图分类 TB3-53;
关键词
Scratch; Size effect; Boundary; Hall-Petch;

机译：划痕;尺寸效果;边界;霍尔 - Petch;

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专利

1. Study of the interaction between the indentation size effect and Hall-Petch effect with spherical indenters on annealed polycrystalline copper [J] . Hou XD, Bushby AJ, Jennett NM Journal of Physics, D. Applied Physics: A Europhysics Journal . 2008,第7期

机译：球形多头压痕对退火多晶铜的压痕尺寸效应与霍尔-Petch效应之间相互作用的研究
2. The interaction between Lateral size effect and grain size when scratching polycrystalline copper using a Berkovich indenter [J] . Kareer A., Hou X. D., Jennett N. M., Philosophical magazine: structure and properties of condensed matter . 2016,第31a36期

机译：使用Berkovich Indenter刮擦多晶铜时横向尺寸效应和粒度之间的相互作用
3. FVPM simulation of scratching induced by a spherical indenter [J] . Charly Euzenat, Sylvain Lavernhe, Christophe Tournier Procedia CIRP . 2019,第2期

机译：FVPM模拟球形压头引起的刮擦
4. LIMITATION OF HALL-PETCH RELATIONSHIP FOR INTERPRETING SCRATCH ON POLYCRYSTALLINE COPPER USING SPHERICAL INDENTER [C] . Xiaodong Hou, Hannah Zhang Nanomechanical Testing in Materials Research and Development Conference . 2018

机译：用球形压模解释多晶铜划痕的霍尔 - 腐败关系的限制
5. Characterization of photocurrent and voltage limitations of copper(indium,gallium)selenide thin-film polycrystalline solar cells. [D] . Thompson, Christopher P. 2008

机译：铜（铟，镓）硒化物薄膜多晶太阳能电池的光电流和电压限制的表征。
6. Inverse Pseudo Hall-Petch Relation in Polycrystalline Graphene [O] . Z. D. Sha, S. S. Quek, Q. X. Pei, -1

机译：多晶硅石墨烯中的逆伪霍尔-皮奇关系
7. FVPM simulation of scratching induced by a spherical indenter [O] . Charly Euzenat, Sylvain Lavernhe, Christophe Tournier 2019

机译：由球形压模引起的划痕的FVPM模拟
8. Hall-Petch hardening in pulsed laser deposited nickel and copper thin films [R] . Knapp, J. A. , Follstaedt, D. M. , Banks, J. C. , 2000

机译：霍尔 - 采取硬化脉冲激光沉积镍和铜薄膜

LIMITATION OF HALL-PETCH RELATIONSHIP FOR INTERPRETING SCRATCH ON POLYCRYSTALLINE COPPER USING SPHERICAL INDENTER

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