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Interface state density effect on the performance of graphene silicon heterojunction solar cell

机译:界面状态密度对石墨烯硅杂交太阳能电池性能的影响

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A planar structure consisting of graphene layer as the hole transport material, and n-type silicon as substrate is simulated. The degradation of this cell caused by high interface state density has been carried out. The simulated results match published experimental results indicating the accuracy of the physics-based model. Using this model, the effect of interface state density as zero, 1×10~(16)cm~(-2), 1×10~(17)cm~(-2) on the photovoltaic performance has been studied. The obtained IV and EQE characteristic based on realistic parameters shows that the interface state playing a prominent role in graphene silicon schottky contact.
机译:模拟由石墨烯层作为空穴传输材料的平面结构,以及作为基板的N型硅。已经进行了由高界面状态密度引起的该细胞的降解。模拟结果匹配已发表的实验结果表明基于物理学的模型的准确性。使用该模型,研究了界面状态密度为零的效果,1×10〜(16)cm〜(-2),1×10〜(17)cm〜(-2)上的光伏性能。基于现实参数的获得的IV和EQE特性表明,界面状态在石墨烯硅肖特基触点中发挥着突出的作用。

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