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Comparative Analysis of Two Methods for Evaluating Wear Rate of Nanocrystalline Diamond Films

机译:一种评价纳米金刚石薄膜磨损率的两种方法的对比分析

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The present work deals with the calculation of the wear rate of nanocrystalline diamond (NCD) films. The NCD films were obtained using microwave plasma enhanced chemical vapor deposition (MW-PECVD) method. (100)-oriented Si wafers were used as a substrate. Reciprocating sliding tests with different loads and test durations were conducted. The depth profiles of wear scars were analyzed by the mechanical (stylus) profilometer and the wear rate was evaluated. The NCD films were broken across the wear scars and the wear rate was estimated by the measurement of the area of wear scar using the scanning electron microscopy (SEM) cross-sectional image. A good agreement was found between the two methods.
机译:本工作涉及计算纳米晶金刚石(NCD)薄膜的磨损率。使用微波等离子体增强的化学气相沉积(MW-PECVD)方法获得NCD膜。 (100) - 剂量的Si晶片用作基材。进行了具有不同载荷和测试持续时间的往复滑动测试。通过机械(触控笔)分析磨损疤痕的深度轮廓,并评估磨损率。使用扫描电子显微镜(SEM)横截面图像,通过磨损疤痕的磨损疤痕断裂,耐磨速率估计。两种方法都发现了一个良好的一致。

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