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Formation of dislocation loops and voids in electron irradiated zinc selenide single crystals

机译:在电子照射锌硒化物单晶中形成位错环和空隙

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The formation of small dislocation loops in size of 2.5 - 45 nm and a density of 1.410~(11) cm~(-2), as well as voids in size <10 nm in ZnS crystals were found by the transmission electron microscopy method (TEM). Samples were examined and irradiated in situ in a JEOL 4000EX-II electron microscope operated at energy of 400 keV and intensity of (1 - 4)10~(19) e/cm~2·s. Fine particles of a new phase in size <10 nm are formed also. These features can be identified from an analysis of moire fringe contrast as phase of ZnO2. Similar defects in single crystals of ZnS formed in situ after irradiation in a transmission electron microscope JEM-100CX operated at energy of 100 keV and intensity of 3,5-10~(17) e/cm~2·s. It was found that the formation of structural defects in ZnS under electron irradiation with above-threshold energy of defect formation (400 keV) is similar to the formation of structural defects in these crystals under electron irradiation with sub-threshold defect formation energy (100 keV).
机译:小脱位环的形成大小为2.5-45nm,密度为1.410〜(11)cm〜(-2),并且通过透射电子显微镜法发现ZnS晶体中的尺寸<10nm的空隙( TEM)。在以400keV的能量和(1-4)10〜(19)E / cm〜2·S的能量为400keV和强度,以原位检查样品并照射原位。还形成了尺寸<10nm的新相的细颗粒。可以根据ZnO2的相位分析Moire条纹对比度来识别这些特征。在透射电子显微镜JEM-100CX中照射后,在透射电子显微镜JEM-100CX中形成的ZnS的单晶类似缺陷,其在100keV和3,5-10〜(17)E / cm〜2·s的强度。结果发现,在缺陷形成(400keV)的上阈值能量(400keV)下,在电子照射下形成ZnS的结构缺陷类似于在具有子阈值缺陷形成能量的电子照射下的这些晶体中的结构缺陷的形成(100keV )。

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