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Synthesis and structural characterization of BiSbTe_3 topological insulator single crystal

机译:BISBT_3拓扑绝缘体单晶的合成与结构特征

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We report the synthesis and structural characterization of the topological insulator BiSbTe3 single crystal. In Bi2Te3, the Fermi level (EF) lies in the bulk conduction band due to electron type bulk carriers induced by Te vacancies. While in Sb2Te3, Fermi level lies in the bulk valance band due to hole type bulk carriers induced by Sb-Te antisite defects. It is difficult to observe the topological properties by transport experiments due to excess contribution from bulk states. By mixing these two compounds, the ratio of bismuth (Bi) to antimony (Sb) can shift the Fermi level (EF) from bulk conduction band to bulk valance band providing an opportunity to realize ideal topological insulator with insulating bulk. In (Bi1-xSbx)2Te3, at Bi:Sb ratio of 1:1, the Fermi level lies in the bulk gap which is ideal for probing topological surface states through transport measurements. We have grown good quality single crystals of BiSbTe3 using modified Bridgman method. The X-ray diffraction analysis, Scanning electron microscopy and Energy dispersive electron spectroscopy confirms the single crystal formation, phase purity and stoichiometric atomic ratio of the prepared crystal. The electrical resistivity measurement of the crystal shows the metallic nature and high quality of the grown crystal.
机译:我们报告的合成与拓扑绝缘体BiSbTe3单晶结构表征。在的Bi2Te3,费米能级(EF)位于在体导带由于碲的空缺引起的电子型散货船。而在Sb2Te3,费米能级位于在本体价带由于锑碲反位缺陷引起的空穴型散货船。这是很难观察到由运输实验拓扑性质是由于从大块状态超额贡献。由这两种化合物混合时,铋(Bi)的锑(Sb)的比率可以从大容量导带中的费米能级(EF)转移到散装价带提供实现理想拓扑绝缘体与绝缘本体的机会。在(BI1-xSbx)2Te3,在毕:1 SB比:1,费米能级位于在本体间隙这是理想的,通过传输测量探测拓扑表面状态。我们已经长大采用改进布里奇曼法BiSbTe3的优良品质单晶。 X射线衍射分析,扫描电子显微镜和能量色散电子能谱确认单晶形成,相纯度和所制备的晶体的化学计量原子比。晶体显示了金属性质和生长的晶体的质量高的电阻率的测量。

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