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Studies on electrical characteristics of organic-inorganic heterostructures

机译:有机无机异质结构电特性研究

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Herein, we report the electrical properties of a heterostructure based on n-Si (100) and zinc phthalocyanine (ZnPc) thin films which displays asymmetric current-voltage (I-V) characteristics under the applied voltage sweep. ZnPc thin films were deposited onto clean silicon wafers and quartz substrates through vacuum thermal evaporation technique. Spectroscopic techniques such as UV-visible, PL and FTIR were used in order to investigate the optical properties of the thin films. The α-phase of the as deposited ZnPc film was recognized from the positions and intensity of the peak in the visible region of UV-visible spectroscopy. Optical energy gap of the deposited ZnPc thin film was estimated from the Tauc's plot and the result is compared with PL spectra. PL spectra show a strong peak located at around ~392 nm, which corresponds to an energy of ~3.13 eV. Microstructural properties of the thin film were studied by the X-ray diffraction which shows preferential orientation along (200) direction and a broad hump appears at around 2θ ~ 30°. SEM and AFM images display uniform growth of ZnPc thin films, comprising spherical nanoparticles over the substrate surface. The surface RMS roughness of the thin film was estimated from AFM analysis and found to be around ~5.3 nm. The room temperature electrical studies of the fabricated device (Al/n-Si (100)/ ZnPc/ Al) were performed which displays rectifying character in the positive sweep and electrical hysteresis at negative voltage sweep. A suitable energy band diagram is proposed to explain the electrical property of the heterojunction device.
机译:在本文中,我们报道了基于正的Si(100)的异质结构和锌酞菁(酞菁锌)薄膜,其施加电压吹扫下显示非对称的电流 - 电压(I-V)特性的电特性。通过真空热蒸发技术将ZnPC薄膜沉积在清洁的硅晶片和石英基板上。使用诸如UV可见,PL和FTIR的光谱技术,以研究薄膜的光学性质。从UV可见光光谱的可见区域中峰的位置和强度识别沉积ZnPC膜的α-阶段。从Tauc的绘图估计沉积的ZnPC薄膜的光学能隙,并将结果与​​PL光谱进行比较。 PL光谱显示出位于约392nm的强峰,其对应于〜3.13eV的能量。通过X射线衍射研究薄膜的微观结构性质,其显示沿(200)方向的优先取向,并且宽驼峰出现在约2θ〜30°。 SEM和AFM图像显示ZnPC薄膜的均匀生长,包括在基板表面上的球形纳米颗粒。从AFM分析估计薄膜的表面rms粗糙度,发现约为5.3nm。进行制造装置(Al / N-Si(100)/ ZnPC / Al)的室温电气研究,其在负电压扫描处显示正扫描和电滞后中的整流特征。提出了一种合适的能带图以解释异质结装置的电性能。

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