首页> 外文会议>PRiME Joint International Meeting of the Electrochemical Society, the Electrochemical Society of Japan, and the Korean Electrochemical Society >Ultra Large Scale Manufacturing Challenges of Silicon Carbide and Gallium Nitride Based Power Devices and Systems
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Ultra Large Scale Manufacturing Challenges of Silicon Carbide and Gallium Nitride Based Power Devices and Systems

机译:碳化硅和氮化镓基功率装置和系统的超大规模制造挑战

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Both silicon carbide (SiC) and gallium nitride (GaN) have the potential of developing transformative power electronics for future needs. The defect density of current devices is quite high and only niche applications will continue to evolve unless major changes are made in the manufacturing process. In this paper we have proposed advanced process control (APC) based single wafer processing (SWP) tools for manufacturing SiC and GaN power devices. New manufacturing tools have the potential of realizing full potential of these materials.
机译:碳化硅(SiC)和氮化镓(GaN)都具有开发变换性电力电子产品以供将来需要。除非在制造过程中进行重大变化,否则当前设备的缺陷密度很高,只有利基应用将继续发展。在本文中,我们提出了基于先进的过程控制(APC)的单晶片处理(SWP)制造SiC和GaN电源装置。新的制造工具具有实现这些材料的全部潜力。

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