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Development of Interatomic Potential of Group IV Alloy Semiconductors for Lattice Dynamics Simulation

机译:晶格动力学模拟IV族合金半导体的网状潜力的研制

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We have newly developed the interatomic potential of Si, Ge or Ge, Sn mixed systems to reproduce the lattice constant, phonon frequency, and phonon dispersion relations in the bulk pure group IV crystal and group IV alloys by molecular dynamics (MD) simulation. The phonon dispersion relation is derived from the dynamical structure factor which is calculated by the space-time Fourier transform of atomic trajectories in MD simulation. The newly designed potential parameter set reproduces the experimental data of lattice constant and phonon frequency in Si, Ge, Sn, and SiGe. Furthermore, the Sn concentration dependence of the phonon frequency, which are not yet clarified, is calculated with three type assumptions of lattice constant in GeSn alloy. This work enables us to predict the elastic and phonon related properties of bulk group IV alloys.
机译:我们新开发了Si,Ge或Ge,Sn混合系统的内部潜力,以通过分子动力学(MD)模拟来再现散装纯族IV晶体和Ⅳ组IV合金中的晶格常数,声子频率和声子分散关系。声子色散关系来自动态结构因子,该动态结构因子由MD模拟中的原子轨迹的时空傅里叶变换计算。新设计的电位参数集在Si,Ge,Sn和Sige中再现晶格常数和声子频率的实验数据。此外,尚未澄清的声子频率的Sn浓度依赖性用Gesn合金中的晶格常数的三种类型的假设计算。这项工作使我们能够预测散装IV合金的弹性和声子相关性质。

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