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Influence of Different Sol-gel Spin Coating Speed on Memristive Behaviour of Pt/TiO2/ZnO/ITO Device

机译:不同溶胶旋转涂层速度对PT / TiO2 / ZnO / ITO装置忆阻行为的影响

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Composite titanium dioxide (TiO2) and zinc oxide (ZnO) thin films were deposited on indium tin oxide (ITO) substrates using sol-gel spin coating technique. The electrical and physical characterizations of three different sol-gel spin coating speed were investigated using two-probe current-voltage (I-V) measurement, field emission scanning electron microscopy (FESEM) and surface profiler (SP) respectively. The I-V measurement results showed the pinched hysteresis loop for every single of devices thus indicate that all the devices are memristive. R_(off)/R_(on) ratio which was defined from the hysteresis loop of device with higher spin speed was slightly higher compared to others.
机译:使用溶胶 - 凝胶旋涂技术沉积在氧化铟锡(ITO)底物上沉积二氧化钛(TiO 2)和氧化锌(ZnO)薄膜。使用双探针电流 - 电压(I-V)测量,场发射扫描电子显微镜(FESEM)和表面分析器(SP)来研究三种不同溶胶 - 凝胶旋转涂层速度的电气和物理特征。 I-V测量结果显示了每种设备的夹持滞后回路,从而指示所有设备都是丢失的。与其他具有较高旋转速度的器件的磁滞回路定义的R_(OFF)/ R_(ON)比率略高。

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