Effects of Annealing Process on the Structural, Optical and Electrical Properties of Copper Oxide Thin Films Grown by Immersion Technique

摘要

The synthesized and characterization on the growth of copper oxide thin films on fluorine-doped tin oxide (FTO) coated glass with annealing and without annealing process has been studied by immersion techniques. Furthermore, ZnO layer has been used in order to improve the absorption spectrum of CuO films. The copper oxide films were analyzed on the morphological, structural, optical and electrical by Field Emission Scanning Electron Microscopy (FESEM), X-ray diffractometer (XRD), UV-Vis spectroscopy (absorbance) and I-V characteristics instruments. The Atomic Force Microscope (AFM) was used in order to characterize the surface imaging of copper oxide films and the thicknesses were measured using a surface profiler. The AFM studies revealed that the roughness of the CuO films increased after annealing and this is due to the formation of large clusters of grains from the merging of small clusters grains. The CuO films thicknesses also become two times higher than the CuO films without annealing process.