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Investigation of Changing Volt-Ampere Characteristics of AlGaInP Heterostructures with Multiple Quantum Wells under Ionizing Radiation

机译:电离辐射下多量子孔的伏安异质结构改变伏安特性的研究

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The results of research into degradation of volt-ampere characteristics of light emitting diodes produced on the base of AlGalnP heterostructures with multiple quantum wells are presented on the example of light emitting diodes (emission wavelengths 623 nm and 590 nm) under gamma quantum and fast neutron radiation in passive powering mode. The shifts of volt-ampere characteristics into the higher voltage range have been observed in conditions of increasing neutron fluence and radiation dose. The observed increase in the resistance of ohmic contacts is caused by the rising resistance of adjacent area, which in its turn results from the changing mobility of charge carriers. The latter varies with the growth of introduced defects under irradiation. Two different areas of current generation have been identified. A mechanism of current generation depends on injected charge carriers in the range of mid-level electron injection. Moreover, the range of high electron injection is distinguished by changing resistance of light emitting diode cores alongside with current generation conditioned by charge carrier injection.
机译:在伽马量子和快速中子下的发光二极管(发射波长623nm和590nm)的示例上,向藻类阱基因碱基的伏特 - Ampere特性降解结果的研究结果无源电力模式下的辐射。在增加中子流量和辐射剂量的条件下,已经观察到伏安特性转移到较高电压范围内。观察到欧姆触点的电阻的增加是由相邻区域的升高性引起的,这在其转弯的变化载流子的迁移率下降。后者随着辐照下引入缺陷的增长而变化。已经识别出两代不同的当前区域。电流产生机制取决于中间电子注射范围内的注入电荷载流子。此外,通过与电荷载体喷射的电流变化的发光二极管芯的电阻改变发光二极管核的电阻来区分高电子喷射的范围。

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