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Study of Optical and Electrical Properties of Tin-Doped Magnesium Phthalocyanine Thin Films Grown by Thermal Co-Evaporation

机译:热共蒸发生长的锡掺杂镁酞菁薄膜光学和电能研究

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The aim of this work is to investigate specific properties of tin-doped magnesium phthalocyanine (Sn-doped MgPc) thin films grown by thermal co-evaporation. Morphological, optical and chemical properties of the doped-films were characterized by atomic force microscopy (AFM), UV-Visible spectroscopy and X-ray photoelectron spectroscopy (XPS). Furthermore, electrical properties of ITO/Sn-doped-MgPc/Al devices such as carrier mobility and carrier concentration were extracted from current-voltage and capacitance-voltage measurements. Morphology of the doped films shows strong dependence on the existence of Sn in the doped films as clearly observed by changing of features of the film surface e.g. surface grain size and roughness. Optical absorption spectra of all conditions provide regular three dominant β-phase peaks at 352, 640 and 691 nm corresponding to absorption from B-band and Q-band, respectively. The electrical properties obtained from ITO/Sn-doped MgPc/Al device suggest that the enhancement of the current flow in the doped device is a result from the increase of both carrier mobility and carrier concentration. Moreover, photoelectron analysis reveals two formations of Sn dopant in MgPc those are tin metal and derivative of tin oxide.
机译:该作品的目的是研究通过热共蒸发生长的掺杂掺杂镁酞菁(Sn-掺杂MGPC)薄膜的具体性质。通过原子力显微镜(AFM),UV可见光谱和X射线光电子能量谱(XPS)的形态学,光学和化学性质的特征在于掺杂膜的形态学,光学和化学性质。此外,从电流 - 电压和电容 - 电压测量中提取诸如载体迁移率和载流子浓度的ITO / Sn-掺杂MgPC / Al器件的电性能。掺杂薄膜的形态显示出通过改变薄膜表面的特征的清楚观察的掺杂薄膜中的Sn的存在强度依赖性。表面粒度和粗糙度。所有条件的光学吸收光谱分别在352,640和691nm处提供常规的三个主要β相峰,对应于来自B波段和Q波段的吸收。从ITO / SN掺杂MGPC / AL器件获得的电性质表明,掺杂装置中的电流的增强是由于载流子迁移率和载流子浓度的增加。此外,光电子分析显示MgPC中的Sn掺杂剂的两种形成,氧化锡的锡金属和衍生物。

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