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Investigation of Optical and Electrical Properties of Amorphous Se_(95-x)S_xZn_5(x=0.2, 2, 5 and 10) Thin Films

机译:无定形SE_(95-x)S_xZN_5(x = 0.2,2,5和10)薄膜的光学和电性能研究

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In this study, we reported that the optical and electrical analysis of amorphous Se_(90-x)S_xZn_5 (x=0.2, 2, 5, 10) thin films. Bulk samples of the investigated material were prepared by melt quenching technique. Thin films of ~ 300nm thickness were deposited on cleaned glass substrates by thermal evaporation technique. The morphological study of the investigated material in powder form carried out by scanning electron microscopy (SEM) confirms the disorder of the material increases at lower sulfur doping (up to 5%) whereas at higher (S) doping (10%) the defects of the material decreases. The optical parameters were estimated from optical absorption spectra data measured from UV-Vis-spectrophotometer in the wavelength range 200-900 nm. It was found that the value of optical band gap (E_g) of the investigated thin films decreases up to lower S doping and increases at higher (S) doping. The other optical parameters such as absorption coefficient (α) and extinction coefficient (K) increases up to lower S doping and decreases at higher S doping. This remarkable change in the values of optical parameters was interpreted on the basis of model proposed by Davis and Mott. Electrical parameters of the investigated thin films were carried out in the temperature range 309-370 K. Analysis of data shows activation energy decreases with the increase of concentration of (S) increases up to 5% and at 10% it increases again.
机译:在这项研究中,我们报道了无定形SE_(90-x)S_XZN_5(X = 0.2,2,5,10)薄膜的光学和电气分析。通过熔融淬火技术制备研究的研究材料样品。通过热蒸发技术沉积在清洁的玻璃基板上沉积〜300nm厚的薄膜。通过扫描电子显微镜(SEM)进行的粉末形式的调查材料的形态学研究证实了材料较低硫掺杂(高达5%)的材料紊乱,而在较高(10%)的缺陷材料减少。从波长范围200-900nm的UV-Vis分光光度计测量的光学吸收光谱数据估计光学参数。结果发现,所研究的薄膜的光带间隙(E_g)的值降低到下部的掺杂,并在更高的掺杂下增加。其他光学参数,例如吸收系数(α)和消光系数(k)增加到较低的S掺杂和较高的掺杂下降。基于Davis和Mott提出的模型解释了光学参数值的这种显着变化。在309-370k的温度范围内进行研究的薄膜的电参数。数据分析显示激活能量随着浓度的增加而降低,高达5%,10%再次增加。

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