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Analysis of Cu(I) Complexes in Copper Sulfate Electroplating Solution by Using Reaction Kinetics with a Chelate Reagent

机译:用螯合试剂使用反应动力学分析硫酸铜电镀溶液中的Cu(I)复合物

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Cu(I) in electroplating solutions was analyzed by absorption of a chelate of Cu(I) with balhocuproinedisulfonic acid, disodium salt (BCS). The absorbance of the color reaction of Cu(I) increased quickly in a few minutes after mixing with BCS and subsequently continued to increase slowly. Cu(I)-PEG (polyethylene glycol) complexes with different chain lengths were detected using MALDI-MS. Results show that Cu(I) ions exist not only as small complexes but also as large complexes with PEG. We divided Cu(I) complexes into two groups, small and large complexes, and assumed the color reaction is a first order reaction with a specific reaction rate constant and simulated the absorption curve with a good correlation and obtained the concentrations and the time constants, inverse of rate constants, of small and large complexes. These are important parameters to control plating solutions. Using this analysis, we monitored the variation of Cu(I) concentrations in production lines for one month.
机译:通过将Cu(I)的螯合物与Balhocuprootialisulfonic酸,二钠盐(BCS)吸收来分析电镀溶液中的Cu(I)。 Cu(I)的颜色反应的吸光度在与BCS混合后几分钟内快速增加,随后继续缓慢增加。使用MALDI-MS检测具有不同链长的Cu(I)-peg(聚乙二醇)复合物。结果表明,Cu(I)离子不仅存在于小络合物中,而且存在与PEG的大型复合物。我们将Cu(I)复合物分为两组,小而大的复合物,并假设颜色反应是具有特定反应速率恒定的第一阶反应,并模拟具有良好相关性的吸收曲线并获得浓度和时间常数,速率常数的反比力,小和大型复合物。这些是控制电镀解决方案的重要参数。使用该分析,我们监测了一个月的生产线中Cu(I)浓度的变化。

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