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Annealing Effect on Characterization of Nano Crystalline SnSe Thin Films Prepared by Thermal Evaporation

机译:通过热蒸发制备的纳米结晶SNSE薄膜表征的退火效应

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Tin Selenide (SnSe) Nano crystalline thin films of thickness 400±20 nm were deposited on glass substrate by thermal evaporation technique at R.T under a vacuum of ~2 ×10-5 mbar to study the effect of annealing temperatures ( as-deposited, 100, 150 and 200) °C on its structural, surface morphology and optical properties. The films structure was characterized using X-ray diffraction (XRD) which showed that all the films have polycrystalline in nature and orthorhombic structure, with the preferred orientation along the (111) plane. These films was synthesized of very fine crystallites size of (14.8-24.5) nm, the effect of annealing temperatures on the cell parameters, crystallite size and dislocation density were observed. Surface morphology of SnSe films as-prepared and annealed are investigated using atomic force microscopy (AFM) analysis, the grain size of these films vary in the rang from (60.12 to 94.70)nm with increasing annealing temperatures. The results obtained from XRD and AFM indicated that these films were Nano crystalline. The optical constants like absorption coefficient, loss factor, quality factor and optical conductivity of these films has been evaluated. The optical properties revealed that SnSe films have optical energy band gap values increase from (1.5-2.2) eV upon annealing temperatures and high value of absorption coefficient hich implies choosing them in solar cell application.
机译:在〜2×10-5毫巴的真空下,通过热蒸发技术在玻璃基板上沉积厚度400±20nm的锡硒(SNSE)纳米晶体薄膜,以研究退火温度的影响(沉积,100 ,150和200)°C在其结构,表面形态和光学性质上。使用X射线衍射(XRD)表征薄膜结构,所述X射线衍射(XRD)显示所有膜在自然界中具有多晶和正交结构,具有沿(111)平面的优选取向。这些薄膜合成了非常细的微晶尺寸(14.8-24.5)Nm,观察到电池参数的退火温度,微晶尺寸和位错密度的效果。使用原子力显微镜(AFM)分析研究了如制备和退火的SNSE膜的表面形态,这些薄膜的晶粒尺寸在来自(60.12至94.70)Nm的响起,随着退火温度的增加。从XRD和AFM获得的结果表明,这些薄膜是纳米结晶。已经评估了这些薄膜的吸收系数,损耗因数,损耗因数,质量因数和光学导电性的光学常数。光学性质显示,SNSE膜具有光能带隙值从退火温度下增加(1.5-2.2)EV,并且在太阳能电池应用中选择它们的吸收系数HICH的高值。

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