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Radiation Hardness Performance of Amorphous Silicon Flat Panels

机译:非晶硅平板辐射硬度性能

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As the digital Radiography (DR) amorphous silicon flat panel (a-Si FP) continues to advance, new applications are being considered on a regular basis. Some of these applications require high doses in excess of 10 kGy (1 MRad) to be delivered cumulatively. However, very little performance data on the aSi-FP is documented for these high dose applications. Thus, when specifying a FP for an application, in addition to the typical performance characteristics such as contrast to noise ratio (CNR) and basic spatial resolution (SRb) as defined by ASTM E2597 and ASTM E2737, there is a question to performance as function of cumulative dose. A-Si FP's have several components that include the scintillator, a-Si converter (consisting of the glass, switching transistors and embedded photo-diodes), and (crystalline) silicon-based electronics for digitization. Since each of these components may receive various levels of dose, the performance of a-Si FP over time is dependent upon how each of these components responds to dose it receives. While there is published documentation that the non-radiation hard silicon-based electronics begin to exhibit significant failures in performance at 100 Gy (10 kRad), other radiation hard components such as the a-Si converter have been less well studied. Moreover, the performance of the scintillator also often degrades as a function of dose. This paper will evaluate the performance of a 2530HE a-Si FP with a GOS scintillator as a function of cumulative dose up to at least 40 kGy (4 MRad). In order to perform this evaluation, a portion of the active area of a 2530HE was shielded and the remaining area was irradiated. Regions of interest (ROIs) for comparison were set up in the irradiated and shielded areas for comparison. Measurements of the mean offset (dark field) values and standard deviations of the flood fields were made at least every 10kGy (1.0 MRad) delivered over a period of about 60 days up to an exposure of 40 kGy (4 MRad) after which a full ASTM E2597 evaluation was run for comparison to the initial FP performance. Results showed that the offsets remained relatively constant up to 2 MRad and gradually increased by about 100 counts per pixel in some of the irradiated ROIs at 40 kGy (4 MRad). The standard deviations in the ROIs remained statistically constant to 40 kGy (4 MRad). This implies that the panels should calibrate and remain functional up to 4 MRad. Sample images and contrast to noise measurements will also be presented at various dose intervals. A separate set of electronics was irradiated and confirmed that the typical silicon-based electronics do fail at 100 Gy (10 kRad) and thus should be shielded from the direct radiation source. Careful characterization of a-Si FP as a function of dose will allow the imagers to be used in variety of applications with a confidence in the performance level of imager. Lastly, another panel was irradiated at 9 and 15 MV for a total dose of 5 MRad over 3 days; preliminary results and sample images will also be shown from this experiment.
机译:随着数字射线照相(DR)非晶硅平板(的a-Si FP)继续前进,新的应用程序正在考虑定期。这些应用中的需要高剂量超过10千戈瑞(1兆拉德)的要被累积递送。然而,在ASI-FP很少的性能数据记载了这些高剂量应用。因此,对于应用程序指定一个FP时,除了典型的性能特征,如对比度,如通过ASTM E2597和ASTM E2737定义噪声比(CNR)和基本的空间分辨率(SRB),有一个性能函数的一个问题的累积剂量。由A-Si FP的具有几个组件,其包括闪烁器基于a-Si转换器(由玻璃,开关晶体管和嵌入式光电二极管),和(结晶)硅类电子数字化。由于这些部件的每可接收剂量各级的a-Si FP随时间的性能取决于如何这些组件的响应于剂量它接收。虽然有被发布的文档,非辐射硬硅基电子开始在100戈瑞(10拉德)的性能表现出显著故障,其它辐射硬组分,例如在a-Si转换器已较少很好的研究。而且,闪烁体的性能也通常会降低作为剂量的函数。本文将评估2530HE的a-Si FP的性能与GOS闪烁体作为累积剂量达到的功能到至少40千戈瑞(4兆拉德)。为了执行该评价中,一个2530HE的有源区被屏蔽的部分和其余区域进行照射。的比较利益(投资回报)​​的地区分别设立在照射和屏蔽的区域进行比较。洪水字段的平均偏移量(暗场)的测量值和标准偏差至少由每10kGy(1.0兆拉德)输送过一段约60天至40千戈瑞(4兆拉德)的曝光后,将完全ASTM E2597评价比较初始FP性能运行。结果表明,该偏移量保持相对恒定达2兆拉德,在40千戈瑞(4兆拉德)的一些被照射ROI的逐渐增加每个像素大约100计数。在感兴趣区的标准偏差保持恒定统计学至40千戈瑞(4兆拉德)。这意味着面板应该校准和保持功能达4兆拉德。样本图像和对比噪声测量也将在不同的剂量间隔呈现。单独的一组电子器件的照射并证实该典型的基于硅的电子器件做失败在100戈瑞(10拉德),并因此应该从直接辐射源被屏蔽。作为剂量的函数的a-Si FP的仔细表征将允许成像器在各种应用中可以使用具有成像器的性能水平的置信度。最后,另一面板在图9和15 MV 5兆拉德的3天的总剂量照射;初步结果和样品的图像也会被从这个实验中示出。

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