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IMPROVE CONTROL AMIDST DIE SHRINK, 3D PACKAGE COMPLICATION

机译:改善控制下的控制,3D封装并发症

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Die sizes continue to shrink and packaging technologies continue to evolve, but the common thread for all of them is the need for increased precision and tighter process control limits to achieve final package yield. Nearly all packaging technologies require connections in the third dimension, above or below the die, thus adding, quite literally, a new dimension to inspection and metrology requirements. Increased focus on reliability for automotive, health care and even mobile electronics is driving the need for improved process control solutions. The combination of higher packaging complexity and the need for improved reliability are driving changes to the requirements around inspection and metrology. Vertical integration continues to grow at a pervasive rate and the need for improved process control in the third dimension is growing rapidly in order to ensure reliability. Vertical integration is designed into nearly all packaging forms, including TSV, RDL, WLP, Fan-in, Fan-out, with a focus on continued increase in the number of I/Os, the pitch of features (RDL and bump) and the overall package size increasing. This integration drives the need for 3D metrology of feature height and coplanarity. In addition, the need to augment raw 3D metrology with defect inspection and 2D metrology data enables a comprehensive view (insight) into the packaging process. Achieve total bump process control with the combination of data from: (1) 2D defect detection - voids and shorts, foreign material, misprocessing; (2) 2D metrology - bump diameter, bump position, bump presence; (3) 3D inspection - bump too tall, bump too short, statistical process control (SPC); (4) Auto classifications - data must make sense and be easy to interpret. By combining high speed 2D, 3D metrology with defect inspection and advanced analytics, the quality of process control data can be exponentially improved to enable quick time-to-results for both process development and HVM control. This paper describes the inspection and metrology challenges of bumps in advanced packaging and the next generation high-throughput bump inspection methodology for wafers with extremely high bump counts as well as the data analysis.
机译:模具尺寸继续缩小,包装技术继续发展,但所有这些的常见线程都需要提高精度和更严格的过程控制限制,以实现最终包装产量。几乎所有包装技术都需要在芯片上方或下方的第三维中的连接,从而完全添加了对检查和计量要求的新维度。增加了对汽车,医疗保健甚至移动电子产品的可靠性的关注,正在推动改进的过程控制解决方案的需求。较高的包装复杂性和提高可靠性的需求的组合正在推动对检查和计量的要求的变化。垂直整合继续以普遍存在的速率生长,并且在第三维中改进的过程控制的需求迅速增长,以确保可靠性。垂直集成设计成几乎所有包装形式,包括TSV,RDL,WLP,扇入,扇出,重点是I / O的数量,特征的音高(RDL和凹凸)和整体包装大小增加。该集成驱动了特征高度和共面的3D计量的需求。此外,需要使用缺陷检查和2D计量数据增强原始3D计量的需要使全面的视图(见解)进入包装过程。通过来自:(1)2D缺陷检测 - 空隙和短裤,异物,错误处理,实现总凹凸过程控制。 (2)2D计量 - 凸块直径,凹凸位置,凸块存在; (3)3D检查 - 凹凸太高,凹凸太短,统计过程控制(SPC); (4)自动分类 - 数据必须有意义,很容易解释。通过组合高速2D,3D计量与缺陷检测和高级分析,过程控制数据的质量可以指数地改善,以便为过程开发和HVM控制来实现快速的时间。本文介绍了先进包装中凸块的检查和计量挑战以及下一代高通量凹凸检查方法,用于极高的凹凸计数以及数据分析。

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