Roll-to-roll atmospheric pressure plasma CVD of SiO2 moisture barrier films 3.05

摘要

Atmospheric pressure plasma enhanced chemical vapor deposition (AP-PECVD) is a new and rapidly evolving technology having clear benefits in terms of equipment costs, footprint size and possibilities for in-line processing. The excellent scalability of the dielectric barrier discharge combined with the possibility to generate non-thermal plasma in low-cost helium free gas mixtures, are essential requirements for large scale processing of functional films on web-rolled substrates. These functional films can be applied as gas barrier films for advanced packaging applications such as medical applications, thin film photovoltaics and flexible OLED encapsulation. The super-linear scaling of the barrier films with the thickness and power per deposited precursor molecule paves the road for high performance barrier foils.