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Application of Taguchi Methods and ANOVA in Optimization of Process Parameters for Surface Roughness of Fused Silica in the Magnetorheological Finishing Processes

机译:Taguchi方法和Anova在磁流学精加工过程中熔融二氧化硅表面粗糙度优化的应用

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Surface roughness plays an important role on optical performances for optics in high-energy laser systems. In this study, optical surface of fused silica were polished by the Magnetorheological Finishing (MRF) processes. The polishing factors in term of Magnetorheological fluid (MR fluid) flow rate, polishing wheel rotational speed, electromagnet current, and polishing ribbon penetration depth, were carried out using an self-developed MRF machine to determine optimum conditions for surface roughness. The settings of the MRF processing parameters were determined by using Taguchi' experimental design method. Taguchi' L_(27)(3~(13)) orthogonal array, signal-to-noise (S/N) ratio and analysis of variance (ANOVA) were employed to investigate the optimal processing parameters. The experimental results indicate that surface with smaller roughness could be machined under the conditions with slower rotating speed and higher flow rate and current, and nearly independent of penetration depth.
机译:表面粗糙度在高能激光系统中对光学性能起着重要作用。在该研究中,通过磁流学精加工(MRF)方法抛光熔融二氧化硅的光学表面。使用自开发的MRF机进行磁流变流体(MR流体)流速,抛光轮转速,电磁铁电流和抛光带渗透深度的抛光因子,以确定表面粗糙度的最佳条件。使用Taguchi'实验设计方法确定MRF处理参数的设置。 Taguchi'L_(27)(3〜(13))正交阵列,采用信号对噪声(S / N)比率和方差分析(ANOVA)来研究最佳处理参数。实验结果表明,在旋转速度较慢的条件下可以在较慢的旋转速度和流速和电流较高的条件下加工表面,并且几乎与穿透深度几乎无关。

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