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Effect of Polishing Plane Vibration on Large-Size Optical Workpieces in Continuous Polishing

机译:抛光平面振动在连续抛光中大尺寸光学工件上的影响

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Effect of the polishing plane vibration on large-size optical workpieces in continuous polishing is studied. The vibration equation was deduced based on the existence of inclination between the polishing plane and z-axis direction. Influences of different parameters, such as the inclination, rotation speeds of the polishing plane and workpiece, the eccentricity and workpiece radius, on the polishing plane vibration were simulated. The simulations results show that rotation speeds of the polishing plane and workpiece is the most significant factor. The chaotic vibration of the polishing plane increases with increasing rotation speeds differences between the polishing plane and workpiece. When differences are small, periodic ups and downs of the polishing plane occur with the increase of polishing time. Experiments verified the influence of rotation speeds differences on the polishing plane vibration. The vibration affects PV of large-size optical workpieces in continuous polishing.
机译:研究了抛光平面振动对连续抛光中大尺寸光学工件的影响。基于抛光平面和Z轴方向之间的倾斜度的存在推导出振动方程。模拟了不同参数的影响,例如倾斜,抛光平面和工件,偏心和工件半径,抛光平面振动上的倾斜旋转速度。仿真结果表明,抛光平面和工件的转速是最重要的因素。抛光平面的混沌振动随着抛光平面和工件之间的速度差异的增加而增加。当差异很小时,抛光平面的周期性UPS和缩小随着抛光时间的增加而发生。实验验证了旋转速度差异对抛光平面振动的影响。振动在连续抛光中影响大型光学工件的光伏。

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