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Effect of Polishing Plane Vibration on Large-Size Optical Workpieces in Continuous Polishing

机译:连续抛光中抛光平面振动对大型光学工件的影响

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Effect of the polishing plane vibration on large-size optical workpieces in continuous polishing is studied. The vibration equation was deduced based on the existence of inclination between the polishing plane and z-axis direction. Influences of different parameters, such as the inclination, rotation speeds of the polishing plane and workpiece, the eccentricity and workpiece radius, on the polishing plane vibration were simulated. The simulations results show that rotation speeds of the polishing plane and workpiece is the most significant factor. The chaotic vibration of the polishing plane increases with increasing rotation speeds differences between the polishing plane and workpiece. When differences are small, periodic ups and downs of the polishing plane occur with the increase of polishing time. Experiments verified the influence of rotation speeds differences on the polishing plane vibration. The vibration affects PV of large-size optical workpieces in continuous polishing.
机译:研究了连续抛光中抛光平面振动对大尺寸光学工件的影响。根据抛光面和z轴方向之间的倾斜度推导了振动方程。模拟了倾斜度,抛光平面和工件的转速,偏心率和工件半径等不同参数对抛光平面振动的影响。仿真结果表明,抛光平面和工件的旋转速度是最重要的因素。抛光平面的混沌振动随着抛光平面和工件之间的旋转速度差的增加而增加。当差异较小时,抛光平面会随着抛光时间的增加而周期性地起伏。实验证实了转速差异对抛光平面振动的影响。振动会影响连续抛光中大型光学工件的PV。

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