Roll-to-roll ALD prototype for 500 mm wide webs - (PPT)

摘要

Roll-to-roll (R2R) atomic layer deposition (ALD) technology is currently being developed to combine the high film quality of ALD with low-cost and high-throughput R2R manufacturing technology. While this technology can be foreseen to enable broad range of new applications, one of the most potential applications is the moisture barrier solution to the flexible PV and OLED markets. Thin single material inorganic ALD barrier layers have been shown to achieve ultra-barrier performance, and are estimated to be very cost-efficient to produce on R2R basis. The practical implementation of the characteristic ALD cycles by use of spatially separated precursor flows is the most challenging task when adopting ALD to R2R manufacturing. To address the scale-up challenges, a small R&D scale reactor for continuous mode ALD (CALD) processing was used to simulate the wider ALD coating head for process development purposes. Trials done with trimethylaluminum + water process at 120°C show a growth rate of ～0.8 A/cycle with 12.5 m/min web speed. The barrier performance of ～18 nm of such film is in 10~(-3) g/(m~2day) level at 38°C and in 90% relative humidity. A scaled-up. R2R ALD system with an oscillating coating head is currently being ramped up and the initial results look promising. The system can be used to with up to 500 mm wide flexible substrates.