首页> 外文会议>International Conference on Concentrator Photovoltaic Systems >Current localization in heterostructures of multijunction solar cells: Causes for arising and diagnostics potential
【24h】

Current localization in heterostructures of multijunction solar cells: Causes for arising and diagnostics potential

机译:多结太阳能电池异质结构的当前定位:产生和诊断潜力的原因

获取原文

摘要

A technique to reveal any local inhomogeneities formed heterointerfaces in multi-junction (MJ) solar cell (SC) structures is proposed. The methodology is based on the nature of two temperature-differentiated processes initiated in the multilayer structures at direct current passing: general cooling with the manifestation of structural areas with a reduced potential barrier for charge carriers and the inevitable concentration of the carrier flux in such areas with the local heating of the structure accompanying this process because of increase in charge carriers density. The methodology is based on the nature of two temperature-differentially directed processes initiated in the multilayer structure of solar cells: general cooling with the manifestation of structural regions with a reduced potential barrier for photogenerated charge carriers and inevitable concentration of the carrier flux in such areas with the local heating of the structure accompanying this process. The triggered avalanche-like process leads to a current pinching with the corresponding localization of EL light emission. Investigation of the EL emission profile at localization points with simultaneous recording the MJ SC voltage values allows making the relative estimations of barrier height in the selected regions of the structure with subsequent absolute determination of the values for the "potential" and the "resistive" inhomogeneities.
机译:提出了一种揭示任何局部不均匀性的技术,提出了多结(MJ)太阳能电池(SC)结构中的异待植物。该方法基于在直流通过的多层结构中引发的两个温度分化的过程的性质:一般冷却,具有结构区域的表现,具有降低的电荷载体的潜在屏障和这些区域中的载体通量的不可避免浓度随着电荷载体密度的增加,伴随该过程的局部加热。该方法基于太阳能电池多层结构中发起的两个温度差异定向工艺的性质:一般冷却,其具有结构区域的表现,具有降低的光生电载流子的潜在屏障,并且在这些区域中的载流子通量的不可避免浓度随着该过程的本地加热结构。触发的雪崩样过程导致电流用EL发光的相应定位夹持。通过同时记录MJ SC电压值的定位点处的el发射轮廓的研究允许在结构的所选区域中的屏障高度的相对估计,随后的绝对确定“电位”的值和“电阻”的不均匀性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号