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The application of Taguchi approach to optimise the processing conditions on bonnet polishing of CoCr

机译:TAGUCHI方法在COCR的阀杆抛光抛光抛光抛光抛光处理条件下的应用

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This paper applied the Taguchi approach to investigate the effects of each polishing parameter and obtain the optimal processing conditions for CoCr alloy polishing. The polishing medium was lum diamond paste with Microcloth(polishing cloth). Surface finish parameter Sa was chosen as criterion for optimization. The experimental result indicates that the optimal polishing condition for CoCr alloy polishing is 5° of precess angle, 800 rpm of head speed, 0.2mm of tool offset and 1.5 bar of tool pressure. With this optimal condition, a confirmatory experiment was conducted. The surface roughness Sa reduced from initial 24nm to 7nm and reduction ratio was 72.5% which was very close to the estimated ratio 64%.
机译:本文应用了Taguchi方法来研究每个抛光参数的效果,并获得Cocr合金抛光的最佳加工条件。抛光介质是带有微小液(抛光布)的Lum金刚石糊。选择表面光洁度参数SA作为优化标准。实验结果表明,CoCr合金抛光的最佳抛光条件为5°的高效角度,800 rpm的头速,刀具偏移0.2mm,刀具压力1.5巴。通过这种最佳状态,进行了确认实验。从初始24nm至7nm和还原率降低的表面粗糙度Sa为72.5%,非常接近估计比例64%。

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