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Superior fill conditions in a replacement gate approach by performing a polishing process based on a sacrificial fill material
Superior fill conditions in a replacement gate approach by performing a polishing process based on a sacrificial fill material
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机译:通过基于牺牲填充材料执行抛光工艺,从而在替代浇口方法中实现了卓越的填充条件
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摘要
In a replacement gate approach, a top area of a gate opening may receive a superior cross-sectional shape after the deposition of a work function adjusting species on the basis of a polishing process, wherein a sacrificial material may protect the sensitive materials in the gate opening.
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