首页> 外国专利> Superior fill conditions in a replacement gate approach by performing a polishing process based on a sacrificial fill material

Superior fill conditions in a replacement gate approach by performing a polishing process based on a sacrificial fill material

机译:通过基于牺牲填充材料执行抛光工艺,从而在替代浇口方法中实现了卓越的填充条件

摘要

In a replacement gate approach, a top area of a gate opening may receive a superior cross-sectional shape after the deposition of a work function adjusting species on the basis of a polishing process, wherein a sacrificial material may protect the sensitive materials in the gate opening.
机译:在替代栅极方法中,在基于抛光工艺沉积功函数调节物质之后,栅极开口的顶部区域可以具有优良的横截面形状,其中牺牲材料可以保护栅极中的敏感材料。开幕。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号