Barrier properties of plastic films coated with Al_2O_3 by roll-to-roll ALD

摘要

Atomic Layer Deposition (ALD) has been enabling future technology since the invention of the method in the early 1970's. Unlike any other thin film coating technique, ALD is based on chemical interactions between the substrate surface and the precursor vapor molecules. In ALD, the gaseous precursors only react at the surface - the film grows "up" from the surface by consecutive atomic layers, as illustrated in Fig. 1.