2162-8742/2013/2(6)/R13/3/$31.00 ? The Electrochemical Society Formation of a Bilayer of ALD-SiO_2 and Sputtered Al_2O_3/ZrO_2 Films on Polyethylene Terephthalate Substrates as a Moisture Barrier

摘要

The moisture barrier properties of a co-sputtered Al_2O_3/ZrO_2 single layer and a bilayer of ALD-SiO_2 and co-sputtered Al_2O_3/ZrO_2 were examined as potential candidates for OLED encapsulation. In the case of the single-layer, the water vapor transmission rate (WVTR) showed a strong correlation with the normalized film density. A dramatic decrease in WVTR was observed for the bilayer barrier film. The deposition sequence of the bilayer also influenced the WVTR, in that the ALD-first barrier showed lower WVTR than the Al_2O_3/ZrO_2-first layer. This was attributed to the superior coverage of ALD-SiO_2 film on particles and pinholes.