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Study on the Experimental Preparation of the SiO-2 Minus Reflection Film of the Solar Spectrum Selective Absorption Coating

机译:太阳能光谱选择性吸收涂层SiO-2减去反射膜的实验制备研究

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In order to meet the applications of the solar power air-conditioning, solar power generation and in the high-end flat plate collector domestic market and architecture, the study on the middle-high temperature solar selective absorption coating has attracted people's attention. In this paper, SS-N-O and SiO_2 were used as the absorption and the minus reflection film. The high-performance middle-high temperature flat solar selective absorption coating with excellent optical properties (absorption ratio was greater than 0.92 and the launch ratio was less than 0.09), strong oxidation resistance and weather resistance was prepared by the use of magnetron sputtering technique. By controlling the process parameters and the experimental tests of the optical properties, a good performance SiO_2 minus reflection film was obtained, and then combined it with SS-N-O to form a relatively inexpensive gradient coating which could meet the relevant performance requirements. The experimental results show that: in the conditions of that the vacuum degree was 2.8 × 10~(-3) Pa, sputtering voltage was 268 V, argon gas flow was 4.0 sccm, oxygen flow rate was 0.7 sccm and the sputtering current was 1.3 A, borosilicate glass 3.3 was used as a carrier, the SiO_2 minus reflection film which reflectance and transmittance were respectively 0.121 and 0.740 was obtained by 30 minutes of stable magnetron sputtering. This minus reflection film was combined well with the gradual double-layer absorption film SS-N-O, and the absorption rate was increased by 0.049.
机译:为了满足太阳能空调的应用,太阳能发电和高端平板收集器国内市场和建筑,研究中高温太阳能选择性吸收涂层的研究吸引了人们的注意。在本文中,SS-N-O和SiO_2用作吸收和减去反射膜。具有优异的光学性质(吸收比大于0.92的高性能中高温扁平太阳能选择性吸收涂层,通过使用磁控溅射技术制备强抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗抗氧化性能。通过控制光学性质的工艺参数和实验试验,获得了良好的性能SiO_2减去反射膜,然后将其与SS-N-O组合形成相对便宜的梯度涂层,可以满足相关性能要求。实验结果表明:在真空度为2.8×10〜(-3)Pa的条件下,溅射电压为268 V,氩气流为4.0 sccm,氧流速为0.7 sccm,溅射电流为1.3 A,硼硅酸盐玻璃3.3用作载体,通过30分钟的稳定磁控溅射获得反射和透射率的SiO_2减去反射膜。稳定的磁控溅射,得到0.121和0.740。该减去反射膜与渐变的双层吸收膜SS-N-O合并良好,并且吸收率升高0.049。

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