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Effects of Technical Elements on Microstructure and Hardness of TiAlN/TiN Coatings

机译:技术元素对TiAln / TiN涂层微观结构和硬度的影响

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40Cr steel substrate was coated with TiAlN/TiN films by multi-arc ion technology. The effect of technical elements on the surface and micro hardness of TiAlN/TiN films had been studied with metallographic microscope, SEM and micro hardness instrument. The results show that the negative bias and the target current have marked influence in performance of TiAlN/TiN films. The content of Ti and Al in films becomes lower and lower when the negative bias becomes higher and higher. The content of Ti/Al of films increases when the target current increases. The micro hardness increases firstly and then drops with the increase of negative bias or the target current.
机译:通过多电弧离子技术用TiAln / TiN膜涂覆40cr钢基板。用金相显微镜,SEM和微型硬度仪研究了技术元素对TiAln / TiN膜表面和微硬度的影响。结果表明,负偏差和目标电流对TiAlN / TiN膜的性能显着影响。当负偏压变得更高且更高时,薄膜中Ti和Al的含量变得越来越低。当目标电流增加时,薄膜的Ti / Al的含量增加。微小硬度首先增加,然后随着负偏差的增加或目标电流倾斜。

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