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Effect of Borax Content on Composition and Microstructure of Boride Layer by Electrodeposition

机译:硼砂含量对电沉积硼化物层组成和微观结构的影响

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Boronizing of silicon steel is performed by electrodeposition in KCl-NaCl-NaF-Na_2B_4O_7·10H_2O molten salts with different amounts of borax. The effect of borax content on composition and microstructure of boride layer is studied. The compositional depth profile of boride layer is measured using the glow discharge spectrometry (GDS) and the depth from the surface to the substrate is taken as the layer thickness. The surface morphology is studied by atomic force microscopy (AFM). It is found that the thickness of the boride layer reached maximum values when the borax content is 0.05 mol. The roughness decreases with raising borax content from 0.01 to 0.05 mol while the further increase of borax content from 0.05 to 0.1 mol results in increase of roughness. The boride layer formed at borax content 0.05 mol shows smallest values of surface roughness.
机译:硅钢的硼化通过电沉积在Kcl-NaCl-Na_2b_4O_7·10H_2O熔融盐中进行,具有不同量的硼砂。研究了硼砂含量对硼化物层组成和微观结构的影响。使用辉光放电光谱法(GDS)测量硼化物层的组成深度分布,并且从表面到基板的深度作为层厚度。通过原子力显微镜(AFM)研究了表面形态。发现当硼砂含量为0.05摩尔时,硼化物层的厚度达到了最大值。粗糙度随着0.01至0.05摩尔的升高而降低,而硼砂含量的进一步增加从0.05至0.1摩尔导致粗糙度的增加。在硼砂含量下形成的硼化物层0.05mol表示表面粗糙度的最小值。

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