Wireless airborne particle counting wafer revolutionizes contamination control, particle monitoring and predictive maintenance in the fab

摘要

The task of particle qualification, particle monitoring and particle source isolation in a timely and economically manner has always been restricted in large part to the tools and technologies available for these tasks. The two available particle detection methods most widely used for particle measurements are monitor wafers and bench-top airborne particle counters. However, these methods have drawbacks.