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Effect of Eu/Co doping on the resistive switching properties of BiFeO_3 thin films

机译:EU / CO掺杂对BIFEO_3薄膜电阻切换性能的影响

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BiFeO_3 and Eu/Co doped BiFeO_3 thin films have been grown on Nb:SrTiO_3 substrates with pulsed laser deposition using the same growth conditions. It was shown that the characteristic of resistive switching would be enhanced by Co doping. By changing the polarity of the external voltage, the BiFe_(0.95)Co_(0.05)O_3 is witched between multilevel stable resistance states without an electroforming process. The resistance ratio is larger than two orders of magnitude and shows stable resistance states. The resistive switching is understood by the electric field-induced carrier trapping and detrapping, which changes the depletion layer thickness at the interface, oxygen vacancy and Co doping play important role in enhanced RS behavior.
机译:BIFEO_3和EU / CO掺杂的BIFEO_3薄膜已经在NB:SRTIO_3基板上生长,使用相同的生长条件具有脉冲激光沉积。结果表明,通过CO掺杂将增强电阻切换的特性。通过改变外部电压的极性,BIFE_(0.95)CO_(0.05)O_3在没有电铸过程的多级稳定电阻状态之间是诽谤。电阻比大于两个数量级,并且显示出稳定的电阻状态。通过电场诱导的载流子捕获和脱扣理解电阻切换,其在界面处改变耗尽层厚度,氧气空位和CO掺杂在增强的RS行为中起重要作用。

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