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Ab-initio Study with Transition State Theory (TST) for the Calculation of the Barrier Height of Migration Energy of Neutral Indium in Silicon

机译:AB-Initio研究了过渡状态理论(TST),用于计算硅中性铟迁移能量的屏障高度

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In this paper, we present ab-initio study on the energy configurations, minimum energy path (MEP), and migration energy of neutral indium atom during diffusion in silicon crystal. From the ab-initio calculation of electronic structure, we could figure out the transient atomistic configurations during the indium diffusion in silicon. We found that the lowest-energy structure (In_s + Si_i~(Td)) consists of indium sitting on a substitutional site for stabilizing a silicon self-interstitial in a nearby tetrahedral position. The second lowest-energy structure was found to be In_i~(Td) , the interstitial indium at the tetrahedral position. We employed the climbing image nudged elastic band (CINEB) method for estimating the MEP between the two local energy minima and the migration energy of the neutral indium, and obtained the MEP of 0.79 eV.
机译:本文在硅晶体中扩散期间,我们对能量配置,最小能量路径(MEP)和中性铟原子的迁移能进行了AB-Initio研究。从电子结构的AB-Initio计算中,我们可以在硅中的铟扩散过程中弄清楚瞬态原子配置。我们发现,最低能量结构(IN_S + SI_I〜(TD))由坐在替代部位上的铟组成,用于稳定附近四面体位置的硅片自口腔。发现第二最低能量结构是IN_I〜(TD),四面体位置的间质铟。我们采用攀岩图像闪烁的弹性带(CineB)方法,用于估计中性铟的两个局部能量最小值和迁移能量之间的MEP,并获得0.79eV的MEP。

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