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Effect of Absorbed Hydrogen on Microstructure of Electrodeposited Cobalt

机译:吸收氢对电沉积钴微观结构的影响

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In electrodeposited cobalt film, the fcc cobalt phase, which is ordinarily recognized as a high temperature phase located over the 690 K region in the phase diagram, emerges at room temperature (1-7). Electrodeposited chromium films often assume hcp and/or fcc structure instead of ordinary bcc with an increasing the total amount of absorbed hydrogen (8-14). The structural changes in electrodeposited cobalt films are generally assumed to be influenced by absorbed hydrogen. However detecting the total amount of absorbed hydrogen in electrodeposited cobalt films was too difficult because the amount was much lower than the total amount of absorbed hydrogen in the electrodeposited chromium films (15-16). In this study, we established a quantitative analysis method of absorbed hydrogen in electrodeposited cobalt films by thermal desorption spectroscopy (TDS). This study elucidates the relationship between the total amount of absorbed hydrogen and the microstructure of the electrodeposited cobalt films.
机译:在电沉积的钴膜中,通常在相图中识别为位于690k区的高温阶段的FCC钴相,在室温(1-7)时出现。电沉积的铬膜通常呈现HCP和/或FCC结构而不是普通的BCC,其增加的吸收氢气量(8-14)。通常假设电沉积钴膜的结构变化受吸收的氢气影响。然而,检测电沉积钴膜中吸收氢的总量太难,因为该量远低于电沉积铬膜中的吸收氢的总量(15-16)。在这项研究中,我们通过热解吸光谱(TDS)建立了电沉积钴薄膜中吸收氢的定量分析方法。本研究阐明了吸收氢气总量与电沉积钴薄膜的微观结构之间的关系。

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