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Charge effects in dielectric films of MIS structures being under high-field injection of electrons at ionizing radiation

机译:电离辐射中的高场注射电子中的MIS结构介电膜中的电荷效应

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In this work we study influence of α-particles and gamma-ray onto MIS structures being under high-field FowlerNordheim injections of electrons into the gate dielectric. We discover that ionizing current occurring at the time of radiation of MIS structures being under high-field injection of electrons by constant current can significantly lower density of injection current and decrease electric field in the dielectric film. We demonstrate that from analysis of time dependency of voltage across MIS structure at the time of constant current flowing we can determine a value of ionization current. The effect can be utilized for sensors of radiations which allow to control both intensity of radiation and a value of integral absorbed dose of ionizing radiation. We develop a model describing processes of change of charge state of MIS structures being under high-field injection at radiation influence. This model takes into account an interaction of injected electrons with products occurring in the dielectric film as a result of ionization radiation.
机译:在这项工作中,我们将α-颗粒和γ射线的影响研究在栅极电介质中的高场禽中的MIS结构上。我们发现在MIS结构辐射时发生的电离电流在通过恒定电流的高场注射电子中,可以显着降低介电膜中的喷射电流密度和减少电场。我们证明,在恒流流动时,通过对MIS结构的时间依赖性的分析,我们可以确定电离电流的值。该效果可用于辐射的传感器,其允许控制辐射强度和整体吸收剂量的电离辐射的值。我们开发了一个模型,描述了在辐射影响下在高场喷射下进行的MIS结构的电荷状态变化过程。该模型考虑了由于电离辐射而在介电膜中发生的产品的喷射电子的相互作用。

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