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Electrodeposition of Te and Cu Thin Films on Boron Doped Diamond (BDD) Electrode

机译:硼掺杂金刚石(BDD)电极上的Te和Cu薄膜电沉积

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摘要

Studies on semiconducting copper chalcogenide materials have received much attention because of their potential applications in various devices such as solar cells, superionic conductors, photodetectors, microwave shielding, etc. (1-5). Among these materials the copper telluride compounds exhibit technological interest due to their potential application in thermoelectric devices (6), highly efficient solar cells, photo-diode devices and various hetero-junction electronic components where they are used as p-type semiconductors.
机译:由于它们在诸如太阳能电池,超离子导体,光电探测器,微波屏蔽等的各种装置中的潜在应用,对半导体铜硫族化物材料的研究已经受到了很多关注。(1-5)。在这些材料中,碲化物化合物由于它们在热电装置(6)中的潜在应用而表现出技术利益,高效的太阳能电池,光电二极管器件和各种异质结电子元件,其中它们用作p型半导体。

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