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Deposition of levitated charged nanoparticles on a substrate using an electrostatic lens

机译:使用静电透镜沉积浮伏的带电纳米颗粒在基板上

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摘要

A charged nanoparticle that is confined and cooled in an ion trap can, in principle, be expelled from the trap and directed onto a substrate with high positional accuracy using an electrostatic lens. This deposition technique could provide a complement to studies of trapped nanoscale objects by allowing examination of the object outside the trap. It may also be used to assemble new types of structures (for example, by depositing a 2D material onto a reactive surface in high vacuum). In our system, a charged nanoparticle held in a quadrupole electric field trap is released from the trap and directed toward a removable indium tin oxide (ITO) coated substrate in ultrahigh vacuum (UHV), using an Einzel lens to focus the particle's trajectory. We have worked with a variety of materials: graphene nanoplatelets around 1 micron in diameter, as well as three-dimensional nanoparticles (including gold, silver, tin, silica, polystyrene, and graphite) with diameters of 200-800 nm. We have consistently detected particles striking the substrate by means of a charge sensor connected to the conductive substrate coating. Some particles, but not others, are observed to stick to the substrate; we are currently working to increase the chance of adhesion for metal nanoparticles by raising their temperature before deposition. We have had some success in locating the deposited particles using a camera positioned above the substrate; efforts to improve the imaging method are ongoing.
机译:原则上,在离子阱中狭窄和冷却的带电纳米颗粒可以从捕集器中排出并指向具有高位置精度的基板上使用静电透镜。该沉积技术可以通过允许检查陷阱之外的物体来提供对被困纳米物体的研究的补充。它还可用于组装新型结构(例如,通过将2D材料沉积到高真空中的反应表面上)。在我们的系统中,在四极电场阱中保持的带电纳米粒子从阱中释放,并向超高真空(UHV)中的可移除铟锡(ITO)涂覆的基底,使用EInzel透镜聚焦粒子的轨迹。我们已经采用了各种材料:石墨烯纳米薄荷直径约为1微米,以及三维纳米颗粒(包括金,银,锡,二氧化硅,聚苯乙烯和石墨),直径为200-800nm。我们通过连接到导电基板涂层的电荷传感器始终检测到撞击基板的粒子。观察到一些颗粒,但不是其他颗粒粘在基板上;我们目前正致力于通过在沉积前提高温度来增加金属纳米颗粒的粘附的机会。我们在使用位于基板上方定位的摄像机定位沉积的颗粒时已经成功了;改善成像方法的努力正在进行中。

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