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Properties of Sputter Deposited ZnO Films Co-doped with Lithium and Phosphorus

机译:溅射沉积的ZnO薄膜的性质与锂和磷共掺杂

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Thin films of ZnO co-doped with lithium and phosphorus were deposited on sapphire substrates by RF magnetron sputtering. The films were sequentially deposited from ultra pure ZnO and Li_3PO_4 solid targets. Post deposition annealing was carried using a rapid thermal processor in O_2 and N_2 at temperatures ranging from 500 °C to 1000 °C for 3 min. Analyses performed using low temperature photoluminescence spectroscopy measurements reveal luminescence peaks at 3.359, 3.306, 3.245 eV for the co-doped samples. The x-ray diffraction 2θ-scans for all the films showed a single peak at about 34.4° with full width at half maximum of about 0.17°. Hall Effect measurements revealed conductivities that change from p-type to n-type over time.
机译:通过RF磁控溅射沉积在蓝宝石基板上沉积ZnO的ZnO薄膜。将薄膜依次沉积来自超纯ZnO和Li_3PO_4固体靶标。在从500℃至1000℃的温度下,使用O_2和N_2中的快速热处理来携带后沉积退火。使用低温光致发光光谱测量进行分析显示为共掺杂样品3.359,3.359,3.245eV的发光峰。所有薄膜的X射线衍射2θ-扫描显示在约34.4°的单个峰值,全宽为约0.17°。霍尔效应测量揭示了从p型变为n型随时间的导电性。

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