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Properties of Al-Ga co-doped ZnO semiconductor thin films deposited on polyethylene terephthalate substrates by radio frequency magnetron sputtering

机译:射频磁控溅射沉积在聚对苯二甲酸乙二醇酯衬底上的Al-Ga共掺杂ZnO半导体薄膜的性能

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摘要

Al and Ga co-doped ZnO (AGZO) semiconductor thin films were deposited on polyethylene terephthalate (PET) substrates by radio frequency magnetron sputtering. Prior to oxide thin film deposition, the hydrophilicity of the surface of the PET substrate was increased by corona discharge treatment. In this study, the influence of corona discharge power on the surface properties of the PET substrates and the effect of substrate temperature on the physical properties of PET/AGZO thin film samples were investigated. After corona discharge treatment to modify the surfaces of the PET substrates, drastic decreases in the contact angle of water on the PET substrates demonstrated that the corona discharge treatment changed the surface wettability of the PET substrates. Experimental results showed that increasing the substrate temperature from room temperature to 135 degrees C significantly enhanced the crystallinity, reduced the surface roughness, and improved the electrical properties of the AGZO thin films. The AGZO thin films deposited on PET substrates at 135 degrees C had the highest Hall mobility of 5.5 cm(2)/Vs.
机译:通过射频磁控溅射将Al和Ga共掺杂的ZnO(AGZO)半导体薄膜沉积在聚对苯二甲酸乙二醇酯(PET)衬底上。在氧化物薄膜沉积之前,通过电晕放电处理提高了PET基材表面的亲水性。在这项研究中,研究了电晕放电功率对PET基材表面性能的影响以及基材温度对PET / AGZO薄膜样品的物理性能的影响。经过电晕放电处理以修饰PET基材的表面后,水在PET基材上的接触角急剧减小,这表明电晕放电处理改变了PET基材的表面润湿性。实验结果表明,将基板温度从室温提高到135摄氏度,可以显着提高结晶度,降低表面粗糙度并改善AGZO薄膜的电性能。在135摄氏度下沉积在PET基板上的AGZO薄膜具有最高的霍尔迁移率,为5.5 cm(2)/ Vs。

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