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Exploiting the Metal-Insulator Transition of VO_2 Thin Films for Terahertz Wave Modulation and Switching

机译:利用vo_2薄膜的金属绝缘体转变,用于太赫兹波调制和切换

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VO_2 is one of the very few natural materials that can be used to modulate terahertz (THz) radiations. A 100-nm thick VO_2, when in its metallic phase, has a charge density of more than ~ 10~(15) cm~(-2) which will strongly reflect and absorb the THz radiation; while in its insulator state, the charge density is lowered by several orders of magnitude to be THz transparent. Therefore, exploiting the metal-insulator transition of VO_2 is a potential approach to modulate or even switch THz radiation for THz optics Here we report that VO_2 epitaxial thin films on sapphire substrate exhibits 85% amplitude modulation depth in a broad bandwidth, while this value can be improved to 95% when VO_2 film is coated on both sides of a substrate. We further demonstrate that with wafer bonding, 4-layered VO_2 thin films exhibit a transmittance as low as -20 dB to -30 dB at their metallic state, enough for switching applications. We also report our proof-of-concept demonstration of THz spatial light modulator that exhibits amplitude modulation as large as 96%, -30 dB pixel-to-pixel crosstalk, and a broad THz bandwidth.
机译:VO_2是非常少量的天然材料之一,可用于调节太赫兹(THZ)辐射。 100nm厚的VO_2,当处于金属相时,具有大于〜10〜(15 )cm〜(-2)的电荷密度,这将强烈反映和吸收THz辐射;虽然在其绝缘体状态下,电荷密度降低了几个数量级,以透明。因此,利用VO_2的金属绝缘体转变是调节甚至切换THZ辐射的潜在方法,在此报告蓝宝石衬底上的VO_2外延薄膜在宽带宽中显示出85%的幅度调制深度,而该值可以当VO_2薄膜涂覆在基材的两侧时,改善为95%。我们进一步证明,通过晶片键合,4层VO_2薄膜在其金属状态下表现出低至-20dB至-30 dB的透射率,足以用于切换应用。我们还报告的THz空间光调制器的我们的验证的概念的示范呈现振幅调制一样大96%,-30dB的像素到像素的串扰,和宽的太赫兹的带宽。

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