Dynamic Properties of Spectrally Selective Reactively Sputtered Metal Oxides

摘要

Thin films of Transition Metal Oxides (TMOs) were deposited by reactive sputtering of pure transition metal targets in Argon-Oxygen gas mixture at elevated substrate temperature for efficient energy consumption. The atomic composition and thickness of the TMO films was determined by Rutherford Backscattering Spectroscopy (RBS). Optical transmittance and reflectance spectrum of the films on quartz substrate was measured with thin film measuring system at room temperature and slightly elevated temperature. The surface morphology and structure of the TMO films was determined with Atomic Force Microscope (AFM).