Resist Technology - Recent Progress and Future Prognosis

摘要

Resist is meeting current targets for resolution and is close in photospeed thanks to many innovations and progress in resist chemistry and processing. There are promising avenues for further improvement of resist that are now in the research stage. LWR and CDU will continue to be a problem that needs to be mitigated or managed. Post processing is likely to be needed to meet requirements. Longer term, slower resists may be more optimal as EUV power sources improve.