Development of New Negative-tone Molecular Resists Based on Phenylcalix 4 resorcinarene for EUVL: Investigation of correlation with the octanol water partition coefficient and the sensitivity of negative -tone molecular resists - (PPT)

摘要

We invested of correlation with the octanol water partition coefficient and the sensitivity of negative-tone molecular resists based on calix [4] resorcinarene (CRA) by Electron Beam Lithography (EBL). The sensitivity of negative-tone molecular resists were higher as the value of the octanol water partition coefficient got smaller. It was confirmed that the octanol water partition coefficient was useful to the guess of sensitivity of negative-tone molecular resists. Furthermore, we have developed new calix [4] resorcinarenes showing well-defined sub 20nm half-pitch patterns. Future study is underway to improve resist performance through material and process optimization to evaluate resist performance by EUV lithography (EUVL).