PTB at its synchrotron laboratory in Berlin has been supporting EUV technology from its very beginning almost 30 years ago, with metrology using synchrotron radiation for at wavelength reflectometry Here we give an overview of the present status of PTB's measurement capabilities which evolved with the technology requirements. Now, PTB j operates two beamlines which both cover the wavelength bands of 13.5 nm and also 6.5 nm for future EUV generations. The second beamline, operational from end 2011, was particularly designed for smaller measurement spot sizes down to 100 μm by 150 μm width, providing higher radiant power at the same time for the investigation of small EUV detectors as used in EUV lithography machines. Our present reflectometer allows us to measure the presently largest mirrors manufactured for EUV lithography. A new ellipsometer-scatterometer, scheduled for delivery in October 2012, is capable of measuring 6-inch-square substrates under arbitrary polarization geometry in a strictly fat-free environment.
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